Double-sided (lapping) polishing machine DS280

keyword:

研磨


Small desktop high-precision, high-speed, high-power double-sided lapping/polishing machine

Rotating tools:

Number of carriers:

Max.Working Size:

Plates rotation speed:

Gear rotation speed:

Installed electrical power:

Voltage:

Specification of machine:

Weight:

230mm

6 pieces

Ø2 inches; thickness 21 mm

0-250tr/min

0-54tr/min

0.8kw

220V single-phase electricity

W640*D380*H660

150kg



category:

  • Description
  • Examples
  • Application
    • Commodity name: Double-sided (lapping) polishing machine DS280
    • Rotating tools:: 230mm
    • Number of carriers:: 6 pieces
    • Max.Working Size:: Ø2 inches; thickness 21 mm
    • Plates rotation speed:: 0-250tr/min
    • Gear rotation speed:: 0-54tr/min
    • Installed electrical power:: 0.8kw
    • Voltage:: 220V single-phase electricity
    • Specification of machine:: W640*D380*H660
    • Weight:: 150kg

    Small desktop high-precision, high-speed, high-power double-sided lapping/polishing machine

    Product Features:

    Small, high-precision, high-speed, high-power double-sided lapping machine / Polishing all-in-one desktop machine, a compact, benchtop precision machining device, is a groundbreaking lapping and polishing system. 

    Can be used in laboratories: Compact size: A benchtop model that occupies minimal floor space, features simple operation, and can be placed directly in a laboratory setting—without concerns about water, electricity, gas, or waste‑liquid disposal. 

    Can be offered to manufacturing enterprises: Flexible configuration: it can be used for small‑scale R&D on a single unit, or scaled up with multiple units in parallel for mass production; it can also be integrated with a single‑sided polishing machine to form a production line, enabling one‑step lapping. Polishing CMP and also The entire repair process. 

    Touchscreen CNC control allows programmable storage of process parameters such as spindle speed, rotation direction, processing time, and polishing fluid. It features a low operational learning curve, high process compatibility, and is ideal for batch production of precision optical crystals and semiconductor substrates, with a particular focus on high-precision double-sided machining of small‑size workpieces. 

    Simultaneous high-speed lapping and polishing of both the top and bottom surfaces ensures the stability and uniformity of the machined parts, boosts yield rates, streamlines the manufacturing process, reduces processing costs, and eliminates reliance on specialized technical expertise. 

     

    Device Parameters

    Specifications

    DS280

    Bowl size 

    280mm

    Rotating tools 

    230mm

    Carriers track net 

    6 pcs * Ø70 mm 

    Max. Working Size 

    Ø2 inches; th 21mm 

    Plates rotation speed 

    0-250tr/min

    Gear rotation speed 

    0-54tr/min

    Plates motor power 

    0.6kw

    Installed electrical power 

    0.8kw

    Voltage 

    220V

    Dimension

    W640*D380*H660mm 

    Weight 

    150kg

     

     

    Key words:
    • Polishing machine
    • equipment
    • power
    • rotational speed
    • motor
    • gear
    • specifications
    • grinding
    • polishing disc
  • MgF2 Specifications Ø38*th5 Parallelism after machining 0.2~0.8S

     Case study

    ID card Specification 8*8*th5 After processing Photovoltaic 1/10 lambda

     

     Case study

     

     Case study

  • Main material processing range for customers:

    Fluorides, zinc selenide, zinc sulfide, lithium niobate, germanium, silicon, sapphire, various laser crystals, ceramics, infrared materials, optical glass, semiconductor materials, and other soft, hard, and brittle substances.

     

    Mainly used for:

    Military industry, aerospace, electronics, semiconductors, laser navigation, machinery, medical devices, optics, and high-end watch manufacturing...